Lake Mary, FL, United States of America

Eduardo Laranjeira

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Faro Technologies, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eduardo Laranjeira. Retrieved from https://idiyas.com/inventor/eduardo-laranjeira

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Eduardo Laranjeira

Introduction

Eduardo Laranjeira is an accomplished inventor based in Lake Mary, Florida. He is known for his contributions to the field of coordinate measuring machines, particularly through his innovative designs that enhance precision and efficiency in measurement processes.

Latest Patents

Laranjeira holds a patent for an articulated arm coordinate measuring machine. This machine features an arm with multiple segments and an end assembly that includes various accessory interfaces. These interfaces allow for the repeatable interchange of multiple accessories, making the machine versatile and adaptable for different measurement tasks.

Career Highlights

Eduardo Laranjeira is currently employed at Faro Technologies, Inc., a company renowned for its advanced measurement and imaging solutions. His work at Faro Technologies has positioned him as a key player in the development of innovative measurement technologies.

Collaborations

Throughout his career, Laranjeira has collaborated with notable colleagues, including John Lucas Creachbaum and Brent Bailey. These collaborations have contributed to the advancement of technology in the field of coordinate measurement.

Conclusion

Eduardo Laranjeira's innovative work in the development of articulated arm coordinate measuring machines showcases his commitment to enhancing measurement technology. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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