Milan, Italy

Edoardo Belloni

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Invensense, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edoardo Belloni. Retrieved from https://idiyas.com/inventor/edoardo-belloni

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Edoardo Belloni: Innovator in Microelectromechanical Systems

Introduction

Edoardo Belloni is a notable inventor based in Milan, Italy. He has made significant contributions to the field of microelectromechanical systems (MEMS). His innovative work focuses on enhancing the accuracy of capacitance measurements in MEMS devices.

Latest Patents

Edoardo Belloni holds 1 patent for his invention related to capacitance gap measurement. This patent describes a microelectromechanical system (MEMS) test structure that includes a plurality of capacitors formed from sense electrodes and capacitive plates. These components have a predetermined geometry and size associated with related MEMS devices, such as MEMS sensors. The invention aims to eliminate the effect of fringing fields on the sensed capacitances of MEMS devices, allowing for accurate measurement of the capacitive gap.

Career Highlights

Edoardo Belloni is currently employed at Invensense, Inc., where he continues to develop innovative solutions in the MEMS sector. His expertise in capacitance measurement has positioned him as a valuable asset in the field of microelectronics.

Collaborations

Edoardo collaborates with talented professionals such as Luca Coronato and Giacomo Gafforelli. Their combined efforts contribute to advancing technology in the MEMS industry.

Conclusion

Edoardo Belloni's work in microelectromechanical systems exemplifies innovation and dedication to improving measurement accuracy in MEMS devices. His contributions are significant in the ongoing development of this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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