Jagaribe, Brazil

Ednaldo Vilar Barreto

This inventor holds 1 USPTO granted patent. Top assignee: Weavexx Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ednaldo Vilar Barreto. Retrieved from https://idiyas.com/inventor/ednaldo-vilar-barreto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Ednaldo Vilar Barreto: Innovator in Papermaking Technology

Introduction

Ednaldo Vilar Barreto is a notable inventor based in Jagaribe, Brazil. He has made significant contributions to the field of papermaking through his innovative designs and patents. His work focuses on enhancing the efficiency and quality of papermaking fabrics.

Latest Patents

Barreto holds a patent for a unique invention titled "Papermaker's double layer forming fabric." This fabric features a top machine side and an opposing bottom paper side, comprising machine direction (MD) yarns and cross machine direction (CMD) yarns interwoven in a repeating pattern. The design includes specific configurations of yarns that improve the fabric's performance while reducing the likelihood of twinning.

Career Highlights

Barreto is currently employed at Weavexx Corporation, where he continues to develop innovative solutions for the papermaking industry. His expertise in fabric design has positioned him as a key player in advancing technology within this sector.

Collaborations

Barreto collaborates with Robert G. Wilson, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of papermaking technology.

Conclusion

Ednaldo Vilar Barreto's contributions to the papermaking industry through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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