This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Edmund M Couillard: Innovator in Photolithography Tool Alignment
Introduction
Edmund M Couillard is a notable inventor based in Essex Junction, Vermont. He has made significant contributions to the field of photolithography, particularly through his innovative methods for diagnosing alignment issues in photolithography tools. His work is essential for enhancing the precision and efficiency of semiconductor manufacturing processes.
Latest Patents
Edmund M Couillard holds 1 patent for a method titled "Stepper alignment process." This patent outlines a comprehensive approach to diagnosing the alignment of photolithography tools. The process involves utilizing a broad band source test, executing a disturbing sequence that is not part of the test, and recording post-disturb test data. The results of the broad band source test are then compared against a specified tolerance. If the results fall outside the acceptable range, mechanical adjustments are made to the photolithography tool to ensure optimal performance.
Career Highlights
Couillard is associated with the International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies and contribute to advancements in the semiconductor industry. His expertise in photolithography aligns with the company's commitment to innovation and excellence in technology.
Collaborations
Throughout his career, Edmund has collaborated with several talented individuals, including Jonathan F Dajnowicz and Peter J Sullivan. These collaborations have fostered a creative environment that encourages the development of innovative solutions in the field of photolithography.
Conclusion
Edmund M Couillard's contributions to the field of photolithography through his patented stepper alignment process demonstrate his commitment to innovation and excellence. His work not only enhances the functionality of photolithography tools but also plays a crucial role in the advancement of semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile