Edlef Buttner

Title: Edlef Buttner: Innovator in Nonlinear Optics

Introduction

Edlef Buttner is a prominent inventor based in Berlin, Germany. He has made significant contributions to the field of nonlinear optics, particularly through his innovative methods and optical arrangements. His work has implications for various applications in physics and engineering.

Latest Patents

Edlef Buttner holds a patent for a method and optical arrangement for generating a nonlinear optical signal on a material that is excited by an excitation field. This patent describes a process where coherent fields of first and second optical pulses of differing frequencies are overlapped in the material in both temporal and spatial relationships. The first pulses are generated in a first beam from a first optical generator unit, while the second pulses come from a second beam of a second optical generator unit that is synchronously pumped by the first unit. This innovative approach allows for the generation of higher harmonic frequencies, enhancing the capabilities of optical signal generation.

Career Highlights

Buttner is associated with A·p·e Angewandte Physik & Elektronik GmbH, where he continues to push the boundaries of optical technology. His work has been instrumental in advancing the understanding and application of nonlinear optical phenomena.

Collaborations

He has collaborated with notable colleagues such as Ingo Rimke and Cees Otto, contributing to a dynamic research environment that fosters innovation and discovery.

Conclusion

Edlef Buttner's contributions to nonlinear optics exemplify the spirit of innovation in the field. His patent and ongoing work at A·p·e Angewandte Physik & Elektronik GmbH highlight his commitment to advancing optical technologies.