Luterbach, Switzerland

Edit Okenwa

This inventor holds 1 USPTO granted patent. Top assignee: Robert Bosch. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edit Okenwa. Retrieved from https://idiyas.com/inventor/edit-okenwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Edit Okenwa: Innovator in Drilling Technology

Introduction

Edit Okenwa is a notable inventor based in Luterbach, Switzerland. She has made significant contributions to the field of drilling technology, particularly with her innovative designs that enhance the efficiency and functionality of drilling tools.

Latest Patents

Edit Okenwa holds a patent for a suction-extraction adapter. This device is designed for use with drilling tools and features a housing that includes a suction-extraction device interface. This interface allows for the detachable connection of a suction-extraction device to the adapter. The tool connection unit of the adapter enables axial fixing on the drilling tool, while the housing is equipped with a locking mechanism to secure the connection.

Career Highlights

Okenwa is currently employed at Robert Bosch G.m.b.h., where she continues to develop innovative solutions in her field. Her work has been instrumental in advancing drilling technology, making it more efficient and user-friendly.

Collaborations

Edit has collaborated with colleagues such as Daniel Eckel and Daniel Beckel, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Edit Okenwa is a pioneering inventor whose work in drilling technology exemplifies the spirit of innovation. Her contributions, particularly the suction-extraction adapter, highlight her commitment to enhancing the functionality of drilling tools.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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