Haguenau, France

Edgar Starck

This inventor holds 1 USPTO granted patent. Top assignee: Siemens Aktiengesellschaft. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Edgar Starck. Retrieved from https://idiyas.com/inventor/edgar-starck

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Edgar Starck: Innovator in Electronic Modules

Introduction

Edgar Starck is a notable inventor based in Haguenau, France. He has made significant contributions to the field of electronics, particularly through his innovative designs and patents. His work has been instrumental in advancing technology in various applications.

Latest Patents

Edgar Starck holds a patent for an electronic module and plastic substrate designed to accept and hold electronic components. This invention showcases his expertise in creating efficient and effective solutions for modern electronic needs. He has 1 patent to his name, reflecting his commitment to innovation.

Career Highlights

Starck is currently employed at Siemens Aktiengesellschaft, a leading global technology company. His role at Siemens allows him to collaborate with other talented professionals and contribute to groundbreaking projects in the electronics sector. His work has garnered attention for its practicality and forward-thinking design.

Collaborations

Some of his notable coworkers include Franz Mittnacht and Klaus Klein. Their collaboration has fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Edgar Starck's contributions to the field of electronics through his patent and work at Siemens Aktiengesellschaft highlight his role as an influential inventor. His dedication to innovation continues to inspire advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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