Northbrook, IL, United States of America

Edgar C Reihl

This inventor holds 2 USPTO granted patents. Top assignee: Shure Incorporated. Active years: 2001-2005.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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2 patents (USPTO):Explore Patents

Title: Innovations by Edgar C. Reihl

Introduction

Edgar C. Reihl is an accomplished inventor based in Northbrook, Illinois. He has made significant contributions to the field of antenna technology, holding two patents that showcase his innovative approach to signal processing.

Latest Patents

Reihl's latest patents focus on a method and apparatus for predictably switching diversity antennas on signal dropout. This low-cost diversity antenna switching system operates by controlling bias voltages on PIN diodes. By increasing the reverse bias voltage on a PIN diode, the RF signal impressed upon the diode is increasingly attenuated. As the PIN diode is forward biased, RF attenuation decreases. The system utilizes two or more PIN diodes to manage signal attenuation from one antenna while gradually decreasing attenuation from another. A microprocessor monitors the received signal strength indicator (RSSI) from a radio receiver to control which antennas are coupled into the receiver, effectively predicting signal fades.

Career Highlights

Reihl is currently employed at Shure Incorporated, a company renowned for its audio products and technologies. His work at Shure has allowed him to apply his inventive skills in a practical setting, contributing to advancements in audio and communication technologies.

Collaborations

One of Reihl's notable collaborators is Mark Allen Kenkel. Their partnership has likely fostered innovative ideas and solutions in their field.

Conclusion

Edgar C. Reihl's contributions to antenna technology through his patents demonstrate his expertise and innovative spirit. His work continues to influence advancements in communication systems.

Profile summary based on public USPTO records.
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