Eddie Ka Ho Chiu

Title: Eddie Ka Ho Chiu: Innovator in Post-Etch Cleaning Processes

Introduction

Eddie Ka Ho Chiu is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of cleaning processes following etching. With a total of 3 patents, his work focuses on enhancing cleaning efficiency while minimizing damage to device structures.

Latest Patents

One of Eddie's latest patents is a method for post-etch cleans. This invention provides a cleaning process that ensures greater cleaning efficiency with reduced damage to device structures. The process begins with a first plasma clean, which may consist of multiple steps. Following this, a first HO based clean is performed, which can include a de-ionized water rinse, a water vapor clean, or a plasma clean that incorporates hydrogen and oxygen. After the first HO based clean, a second plasma clean is executed, again potentially comprising multiple steps. This is followed by a second HO based clean, which may also involve a de-ionized water rinse, a water vapor clean, or a plasma clean with hydrogen and oxygen. The invention is particularly useful after various etching processes, such as metal etch or polysilicon etch, and allows for the removal of photoresist at low temperatures.

Career Highlights

Eddie has worked with prominent companies in the semiconductor industry, including Novellus Systems Incorporated and STMicroelectronics S.r.l. His experience in these organizations has contributed to his expertise in developing innovative cleaning methods.

Collaborations

Throughout his career, Eddie has collaborated with notable colleagues, including David L Chen and Yuh-Jia (Jim) Su. These partnerships have likely enriched his work and led to advancements in his field.

Conclusion

Eddie Ka Ho Chiu is a distinguished inventor whose innovative methods for post-etch cleaning processes have made a significant impact in semiconductor manufacturing. His contributions continue to enhance the efficiency and effectiveness of cleaning processes in the industry.