Ed Yum

Title: Ed Yum - Innovator in Reticle Design Pattern Detection

Introduction

Ed Yum is a notable inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor manufacturing. His innovative work focuses on methods and systems for detecting defects in reticle design patterns, which are crucial for the wafer printing process in the semiconductor industry.

Latest Patents

Ed Yum holds a patent for "Methods and systems for detecting defects in a reticle design pattern." This computer-implemented method involves acquiring images of the reticle design pattern using a sensor positioned on a substrate near the image plane of an exposure system. The images obtained illustrate how the reticle design pattern will be projected onto a wafer during the wafer printing process. The method also includes detecting defects in the reticle design pattern by comparing images corresponding to different parameters of the wafer printing process. He has 1 patent to his name.

Career Highlights

Ed Yum is currently employed at Kla Tencor Corporation, a leading company in the semiconductor equipment industry. His work at Kla Tencor has allowed him to apply his expertise in defect detection and contribute to advancements in semiconductor manufacturing technology.

Collaborations

Ed collaborates with various professionals in his field, including his coworker Ingrid B. Peterson, to enhance the effectiveness of their innovations and improve the quality of semiconductor manufacturing processes.

Conclusion

Ed Yum's contributions to the detection of defects in reticle design patterns highlight his role as an innovator in the semiconductor industry. His work continues to influence advancements in wafer printing technology and improve manufacturing processes.