Fulshear, TX, United States of America

Ed Keppler

This inventor holds 1 USPTO granted patent. Top assignee: C&j Spec-Rent Services, Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ed Keppler. Retrieved from https://idiyas.com/inventor/ed-keppler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Ed Keppler: Innovator in RF-Safe Technology

Introduction

Ed Keppler is an accomplished inventor based in Fulshear, Texas. He holds a patent that showcases his expertise in radio frequency (RF) safety technology. His innovative approach has made significant contributions to the field, particularly in the oil and gas industry.

Latest Patents

Keppler's notable patent is titled "Assembly of RF-safe switch and detonator system in a non-RF free environment." This invention outlines a method for assembling an RF-safe switch and detonator system specifically designed for use in oil well perforating guns at well-sites that are not RF free. This technology is crucial for ensuring safety in environments where RF interference could pose risks.

Career Highlights

Ed Keppler is currently employed at C&J Spec-Rent Services, Inc., where he applies his innovative skills to enhance safety protocols in the industry. His work has been instrumental in developing systems that mitigate risks associated with RF exposure.

Collaborations

Keppler collaborates with his coworker, Steven DeLozier, to further advance their projects and ensure the successful implementation of their technologies.

Conclusion

Ed Keppler's contributions to RF safety technology exemplify his commitment to innovation and safety in the oil and gas sector. His patent reflects a significant advancement in ensuring safe operations in challenging environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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