This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1978.
Company Filing History:
Years Active: 1978
Title: The Innovations of Eckehard Ebert
Introduction
Eckehard Ebert is a notable inventor based in Böblingen, Germany. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on improving the integrity of semiconductor dielectric layers.
Latest Patents
Eckehard Ebert holds a patent for a silicon oxide/silicon nitride mask. This innovation features improved integrity for a semiconductor dielectric layer formed of silicon nitride. The layer has a uniform dispersion of carbon, which provides reduced intrinsic tensile stresses of less than 10 × 109 dyn/cm2.
Career Highlights
Eckehard Ebert is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore various advancements in semiconductor technology. His contributions have been instrumental in enhancing the performance and reliability of semiconductor devices.
Collaborations
Eckehard has collaborated with notable colleagues such as Armin Bohg and Erich Mirbach. These collaborations have fostered innovation and have led to significant advancements in their respective fields.
Conclusion
Eckehard Ebert's contributions to semiconductor technology through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.