This inventor holds 1 USPTO granted patent. Top assignee: Nalco Chemical Company. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: The Innovations of Earnest M Kerr
Introduction
Earnest M Kerr is a notable inventor based in Naperville, IL (US). He has made significant contributions to the field of lubricating fluids, particularly in the context of slicing silicon ingots. His innovative approach has led to the development of a unique lubricating composition that enhances the efficiency of silicon wafer production.
Latest Patents
Earnest M Kerr holds a patent for lubricating fluids specifically designed for slicing silicon ingots. This patent describes a lubricating composition that includes a soap, a phosphorous-containing compound, and an ethylene oxide-propylene oxide polymer. The phosphorous compound serves as a low-temperature, extreme pressure lubricant, while the ethylene oxide-propylene oxide polymer functions as a high-temperature, extreme pressure lubricant. The suitable soaps for this composition include C6-C18 fatty acids reacted with triethanolamine or aminoethanolamine. Additionally, the formulation may incorporate biocides or fungicides, an antifoam, and a complexing aid such as EDTA.
Career Highlights
Earnest M Kerr is associated with Nalco Chemical Company, where he has applied his expertise in developing innovative lubricating solutions. His work has been instrumental in advancing the technology used in the semiconductor industry, particularly in the efficient slicing of silicon wafers.
Collaborations
Throughout his career, Earnest has collaborated with various professionals, including his coworker Charles C Payne. Their combined efforts have contributed to the development of effective solutions in the field of lubricating fluids.
Conclusion
Earnest M Kerr's contributions to the field of lubricating fluids for silicon ingots exemplify the importance of innovation in technology. His patent reflects a significant advancement that benefits the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
