Hudson, WI, United States of America

Earnest DeWayne Tooley


 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Earnest DeWayne Tooley

Introduction

Earnest DeWayne Tooley is a notable inventor based in Hudson, Wisconsin. He has made significant contributions to the field of technology, particularly in the area of high-speed rinsing solutions. With two patents to his name, Tooley's work showcases his dedication to innovation and problem-solving.

Latest Patents

Tooley's latest patent focuses on high-speed rinsing solution application. This patent includes various methods and apparatus embodiments designed to enhance the efficiency of rinsing solutions. One embodiment features a substructure with an elliptical track and a catheter delivery system that includes multiple carriages. Each carriage is equipped with a catheter delivery mechanism, and a carousel drive system allows the carriages to circulate around the substructure. Additionally, a rotary timing valve is positioned above the central portion of the substructure, featuring multiple outlets connected to the catheter delivery mechanisms by hoses. A hose table supports these hoses, ensuring a streamlined operation.

Career Highlights

Throughout his career, Tooley has worked with several companies, including MPSC Australia, Pty., Ltd. and MPSC, Inc. His experience in these organizations has contributed to his expertise in developing innovative solutions.

Collaborations

Tooley has collaborated with notable individuals such as Andrew Michael Leiner and Ulises Pardo Arche. These partnerships have likely enriched his work and expanded his innovative capabilities.

Conclusion

Earnest DeWayne Tooley's contributions to the field of technology through his patents and collaborations highlight his role as an influential inventor. His work in high-speed rinsing solutions demonstrates the impact of innovation on improving efficiency in various applications.

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