Company Filing History:
Years Active: 2012-2014
Title: Innovations of Dustin Laur
Introduction
Dustin Laur is an accomplished inventor based in Forest Grove, OR (US). He has made significant contributions to the field of focused ion beam (FIB) systems, holding a total of 2 patents. His work is characterized by innovative solutions that enhance the performance and efficiency of ion beam technology.
Latest Patents
One of Dustin Laur's latest patents is a plasma igniter for an inductively coupled plasma ion source. This invention describes a focused ion beam (FIB) system that includes an inductively coupled plasma ion source and an insulating plasma chamber containing the plasma. The system features a conducting source biasing electrode that is in contact with the plasma and is biased to a high voltage to control the ion beam energy at a sample. The plasma within the chamber acts as a virtual source for an ion column, which comprises one or more lenses that form a focused ion beam on the surface of a sample for imaging or FIB processing. The plasma is initiated by a plasma igniter mounted near the column, which induces a high voltage oscillatory pulse on the source biasing electrode. This design minimizes capacitive effects from the cable connecting the source biasing electrode to the biasing power supply. Additionally, proper selection of aperture materials helps to minimize ion beam sputtering of the apertures.
Career Highlights
Dustin Laur is currently employed at FEI Company, where he continues to develop innovative technologies in the field of ion beam systems. His expertise and contributions have positioned him as a key figure in advancing the capabilities of focused ion beam applications.
Collaborations
Dustin has collaborated with notable coworkers, including Anthony Graupera and Sean Kellogg, who share his commitment to innovation and excellence in their respective fields.
Conclusion
Dustin Laur's work exemplifies the spirit of innovation in the realm of focused ion beam technology. His patents and contributions continue to influence advancements in this critical area of research and development.