Raritan, NJ, United States of America

Duru Han

This inventor holds 1 USPTO granted patent. Top assignee: Ethicon, Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duru Han. Retrieved from https://idiyas.com/inventor/duru-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Duru Han - Innovator in Medical Technology

Introduction

Duru Han is a notable inventor based in Raritan, NJ (US). He has made significant contributions to the field of medical technology, particularly in the development of sutures. His innovative approach has led to the creation of a unique method for manufacturing barbed sutures, which enhances surgical procedures.

Latest Patents

Duru Han holds a patent for a "Method and system for manufacturing a barbed suture." This invention involves a sophisticated method for creating a monofilament barbed suture. The process includes positioning a mandrel device adjacent to a rotary mount equipped with a razor. The mandrel device consists of a mandrel mounted to a fixture, with a filament in contact with the mandrel's curved surface. The razor is rotated to create a linear cut in the filament, forming a barb at a precise cut depth. Notably, the mandrel has a diameter of 4 millimeters or less, showcasing the precision of his invention.

Career Highlights

Duru Han is associated with Ethicon GmbH, a company renowned for its advancements in surgical products. His work at Ethicon reflects his commitment to improving surgical techniques and patient outcomes through innovative solutions.

Conclusion

Duru Han's contributions to the field of medical technology, particularly through his patented method for manufacturing barbed sutures, highlight his role as an influential inventor. His work continues to impact the medical community positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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