Beijing, China

Duosi Tang

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Fuzhou Boe Optoelectronics Technology Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duosi Tang. Retrieved from https://idiyas.com/inventor/duosi-tang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Duosi Tang: Innovator in Display Technology

Introduction

Duosi Tang is a notable inventor based in Beijing, China. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Duosi Tang holds a patent for a detection structure, display panel, detection device for detecting display panel, and detection system. This invention includes a detection structure located within a display panel, comprising test units and groups of first connecting lines. Each test unit features a chip bonding part and test pin parts, with second connecting lines linking them. The design allows for efficient electrical connections during lightening tests, enhancing the functionality of display panels.

Career Highlights

Throughout his career, Duosi Tang has worked with prominent companies in the technology sector. He has been associated with Fuzhou Boe Optoelectronics Technology Co., Ltd. and Boe Technology Group Co., Ltd. His work in these organizations has contributed to advancements in display technologies.

Collaborations

Duosi Tang has collaborated with notable colleagues, including Xin Fang and Yang Yu. Their combined expertise has fostered innovation in their respective fields.

Conclusion

Duosi Tang's contributions to display technology through his patent and career achievements highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…