Nanchang, China

Duo Xu

This inventor holds 1 USPTO granted patent. Top assignee: Nanchang Hangkong University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duo Xu. Retrieved from https://idiyas.com/inventor/duo-xu-l8uvpecq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Duo Xu - Innovator in Wearable Motion Capture Technology

Introduction

Duo Xu is a prominent inventor based in Nanchang, China. He has made significant contributions to the field of motion capture technology. His innovative work focuses on developing wearable devices that enhance the accuracy and stability of motion data acquisition.

Latest Patents

Duo Xu holds a patent for a "Wearable motion capture glove based on flexible optical fiber." This invention relates to the field of motion capture and includes a glove body, multiple motion acquisition sensing devices, and a glove packaging tool. Each motion acquisition sensing device consists of a data acquisition and processing module, a circuit splint, and a flexible polymer profiled optical fiber. The design ensures that the glove can be worn closely to the finger joint, allowing for more stable and accurate data acquisition.

Career Highlights

Duo Xu is affiliated with Nanchang Hangkong University, where he continues to advance his research in wearable technology. His work has garnered attention for its potential applications in various fields, including gaming, rehabilitation, and virtual reality.

Collaborations

Duo Xu collaborates with notable colleagues, including Bin Liu and Qi Wang, who contribute to his research endeavors. Their combined expertise enhances the development of innovative solutions in motion capture technology.

Conclusion

Duo Xu's contributions to wearable motion capture technology exemplify the intersection of innovation and practical application. His work not only advances the field but also opens new avenues for future research and development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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