Company Filing History:

2 out of 37,972

Micron Technology Incorporated

patents

Years Active: 2019-2020

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2 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10749041 - Programmable charge storage transistor, an array of elevationally-extending strings of memory cells, methods of forming Si3Nx, methods of forming insulator material that is between a control gate and charge-storage material of a programmable charge-storage transistor, methods of forming an array of elevationally-extending strings of memory cells, a programmable charge-storage transistor manufactured in accordance with methods, and an array of elevationally-extending strings of memory cells man (2020-08-18),

2. 10483407 - Methods of forming sin, methods of forming insulator material between a control gate and charge-storage material of a programmable charge-storage transistor, and methods of forming an array of elevationally-extending strings of memory cells and a programmable charge-storage transistor manufactured in accordance with methods (2019-11-19),

Title: Innovations of Duo Mao in Charge Storage Technology

Introduction

Duo Mao is a notable inventor based in Boise, ID (US), recognized for his contributions to charge storage technology. With a total of 2 patents, he has made significant advancements in the field of programmable charge-storage transistors and memory cell arrays.

Latest Patents

Duo Mao's latest patents include innovative methods for forming Si3Nx and insulator materials that enhance the functionality of programmable charge-storage transistors. His work on an array of elevationally-extending strings of memory cells showcases his expertise in semiconductor technology. One of his key methods involves decomposing a silicon-comprising precursor molecule into distinct decomposition species, which react to form SiN. This process is crucial for developing advanced memory technologies.

Career Highlights

Duo Mao is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing new materials and methods that improve the performance and efficiency of memory devices.

Collaborations

Duo has collaborated with talented coworkers, including Fei Wang and Kunal Shrotri, contributing to a dynamic research environment that fosters innovation.

Conclusion

Duo Mao's contributions to charge storage technology and his innovative patents position him as a key figure in the semiconductor industry. His work continues to influence advancements in memory technology, paving the way for future innovations.

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