Beijing, China

Duling Qin

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duling Qin. Retrieved from https://idiyas.com/inventor/duling-qin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Duling Qin: Innovator in Screen Printing Technology

Introduction

Duling Qin is a notable inventor based in Beijing, China. He has made significant contributions to the field of screen printing technology. His innovative approach has led to the development of a unique screen printing device and method.

Latest Patents

Duling Qin holds a patent for a screen printing device and a screen printing method. The device includes a screen plate with a conductive mesh and an electrifying device that applies voltage to the mesh. The method involves using a printing head to rub against the screen plate to print ink onto a substrate, while voltage is applied to the conductive mesh during the process. This innovation enhances the efficiency and effectiveness of silk screen printing.

Career Highlights

Throughout his career, Duling Qin has worked with prominent companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Chengdu BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has contributed to his expertise in screen printing technology.

Collaborations

Duling Qin has collaborated with talented individuals such as Qian Qu and Yuhong Zhou. These partnerships have fostered innovation and development in his projects.

Conclusion

Duling Qin's contributions to screen printing technology demonstrate his commitment to innovation and excellence. His patent and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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