Duk-Ho Hong

Title: Innovations of Duk-Ho Hong in Chemical Mechanical Polishing

Introduction

Duk-Ho Hong is a notable inventor based in Goyang-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 3 patents to his name. His work primarily focuses on enhancing the efficiency and effectiveness of polishing processes in semiconductor manufacturing.

Latest Patents

Duk-Ho Hong's latest patents include a flexible membrane for a polishing head and a chemical mechanical polishing apparatus. The flexible membrane is designed to hold a substrate with a vacuum and compress it against a polishing pad. This innovative design includes a compressing plate that features a dividing member to create multiple regions for pneumatic pressure application. The chemical mechanical polishing apparatus incorporates advanced features such as a polishing table, a carrier head, and multiple polishing end point detectors, ensuring precise control over the polishing process.

Career Highlights

Duk-Ho Hong is currently employed at Samsung Electronics Co., Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in improving the performance and reliability of CMP processes, which are critical for the production of high-quality semiconductor devices.

Collaborations

Duk-Ho Hong has collaborated with esteemed colleagues such as Ja-Eung Koo and Sang-rok Hah. Their combined expertise has contributed to the advancement of CMP technologies and the successful implementation of innovative solutions in the industry.

Conclusion

Duk-Ho Hong's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a valuable asset to Samsung Electronics Co., Ltd. and the broader technological community.