This inventor holds 1 USPTO granted patent. Top assignee: Jusung Engineering Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: The Innovative Contributions of Duck-Ho Kim
Introduction
Duck-Ho Kim is a prominent inventor based in Seoul, South Korea. He is known for his significant contributions to the field of etching technology. His innovative approach has led to the development of a unique method for forming etching masks, which is crucial in various manufacturing processes.
Latest Patents
Duck-Ho Kim holds a patent for a method of forming an etching mask. This invention involves several steps, including depositing a hard mask film containing silicon on a substrate, applying a photoresist on the hard mask film, patterning the photoresist, and etching the hard mask film using the photoresist pattern as a mask. The method enhances the etch selectivity of the hard mask film to the photoresist pattern by utilizing a mixed gas during the etching process.
Career Highlights
Duck-Ho Kim is currently associated with Jusung Engineering Co., Ltd., where he continues to innovate and contribute to advancements in etching technologies. His work has been instrumental in improving manufacturing processes in the semiconductor industry.
Collaborations
Duck-Ho Kim has collaborated with notable colleagues, including Gi-Chung Kwon and Nae-Eung Lee. Their combined expertise has fostered a productive environment for innovation and development.
Conclusion
Duck-Ho Kim's contributions to the field of etching technology exemplify the impact of innovative thinking in engineering. His patent for a method of forming etching masks showcases his commitment to advancing manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile