This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1976-1978.
Company Filing History:
Years Active: 1976-1978
Title: Duane E Johnson: Innovator in Electron Beam Resists
Introduction
Duane E Johnson is a notable inventor based in Los Gatos, CA (US). He has made significant contributions to the field of electron beam resists, holding a total of 2 patents. His work has advanced the technology used in various applications, showcasing his expertise and innovative spirit.
Latest Patents
Johnson's latest patents include a process for preparing electron beam resists. This process involves reacting a film that is a copolymer of methyl methacrylate and methacrylic acid with a tertiary amine. Another significant patent focuses on positive polymeric electron beam resists, where it has been discovered that the sensitivity of these resists can be increased by using polymers with a molecular weight of at least one million. This advancement allows for a reduction in the required radiation to below 3 × 10-6 coulombs/cm2.
Career Highlights
Duane E Johnson has had a distinguished career, primarily working with International Business Machines Corporation (IBM). His innovative work in the field of electron beam resists has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Johnson has collaborated with notable coworkers such as Wayne Martin Moreau and Charles A Cortellino. These collaborations have contributed to the advancement of technology in their respective fields.
Conclusion
Duane E Johnson's contributions to the field of electron beam resists demonstrate his innovative capabilities and commitment to advancing technology. His patents reflect a deep understanding of materials and processes that are crucial for future developments in this area.