Seongnam-si, South Korea

Du-heon Song

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Du-heon Song

Introduction

Du-heon Song is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for fabricating semiconductor devices.

Latest Patents

Du-heon Song holds a patent for a method of fabricating a semiconductor device. This method effectively reduces or eliminates the interference effect between word lines. The process involves forming a plurality of gate patterns on a substrate, creating a first insulating layer between these gate patterns, and etching the first insulating layer to a predetermined depth. Additionally, a second insulating layer is formed on the gate patterns and the first insulating layer, utilizing a low-dielectric-constant material between the gate patterns.

Career Highlights

Du-heon Song is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to advancements in semiconductor fabrication techniques. His expertise in this area has positioned him as a valuable asset to the company.

Collaborations

Du-heon Song has collaborated with notable colleagues, including Yong-lack Choi and Chang-Hyun Cho. These collaborations have further enhanced his work and contributed to the success of their projects.

Conclusion

Du-heon Song's innovative methods in semiconductor device fabrication demonstrate his significant impact on the technology industry. His contributions continue to influence advancements in semiconductor technology, showcasing the importance of innovation in this field.

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