Dryer A Matlock

Title: Innovations by Dryer A. Matlock in Semiconductor Technology

Introduction

Dryer A. Matlock is an influential inventor based in Melbourne, Florida, known for his contributions to the field of semiconductor technology. He holds a notable patent that addresses critical aspects of gate structure formation in integrated circuits, an area essential for enhancing device performance and reliability.

Latest Patents

Matlock's patent, titled "Technique for forming planarized gate structure," introduces a direct moat wafer processing method that maximizes the functional continuity of a field oxide layer. This innovative technique involves a systematic processing sequence that forms differently sized apertures in the oxide layer. The first aperture defines the size of the polysilicon gate, while the second surrounds the completed gate structure and outlines the geometry of the source/drain regions applied to the substrate’s exposed areas. The vertically aligned sidewalls of both apertures maintain the integrity of the field oxide layer, essential for device functionality. Additionally, a gate interconnect layer is selectively formed atop the field oxide layer, ensuring a reliable conductive path to the gate.

Career Highlights

Dryer A. Matlock has made significant strides in his career at Harris Corporation, a leading company known for its advanced electronic solutions. His work focuses on innovative techniques that have the potential to influence the semiconductor industry substantially. Matlock's unique insights into gate structure fabrication reflect his deep understanding of materials science and engineering principles, contributing to more efficient manufacturing processes.

Collaborations

Matlock has collaborated with notable colleagues, including Richard L. Lichtel, Jr. and Lawrence G. Pearce. Together, they have worked on various projects that push the boundaries of technology in the semiconductor field, fostering an environment of innovation and expertise.

Conclusion

Dryer A. Matlock stands out as a pioneering inventor who has contributed valuable innovations to semiconductor technology. His patent on forming planarized gate structures not only enhances the performance of integrated circuits but also showcases his commitment to advancing the field. Through his work and collaborations, Matlock plays a significant role in shaping the future of electronic devices.