This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1979.
Company Filing History:
Years Active: 1979
Title: Drew E Albrecht: Innovator in E-beam Technology
Introduction
Drew E Albrecht is a notable inventor based in Flanders, NJ (US). He has made significant contributions to the field of electron beam systems, particularly in methods that enhance focus correction. His innovative approach addresses critical challenges in semiconductor manufacturing.
Latest Patents
Drew E Albrecht holds a patent for a "Method and apparatus for applying focus correction in E-beam system." This invention provides a solution for compensating wafer warp and mask tilt in electron beam systems. The patent outlines a registration system that measures the position of registration marks and calculates magnification errors. It also details how to apply compensating currents to dynamic focusing coils, ensuring that the effective beam focal plane aligns with the wafer or mask plane at each chip site. He has 1 patent to his name.
Career Highlights
Drew E Albrecht is associated with International Business Machines Corporation (IBM), where he has contributed to advancements in electron beam technology. His work has been instrumental in improving the precision and efficiency of semiconductor fabrication processes.
Collaborations
Drew has collaborated with notable colleagues, including Samuel Kay Doran and Michel S Michail. Their combined expertise has fostered innovation in the field of electron beam systems.
Conclusion
Drew E Albrecht's contributions to E-beam technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at IBM highlight his role as a key figure in advancing this critical technology.