This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 1978.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1978
Title: The Innovations of Doyle O. Etter
Introduction
Doyle O. Etter is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic elements through his innovative patents. His work primarily focuses on polymeric films and their applications in pressure-sensitive adhesives.
Latest Patents
Doyle O. Etter holds a patent for "Polymeric films peelably adhered to a pressure-sensitive adhesive." This invention involves a photographic element that features a pressure-sensitive adhesive layer for mounting purposes. The element is protected by an ethylene polymer layer, which is applied through extrusion at high temperatures exceeding 450°F. This defined extrusion process allows for the protective layer to be applied at high line speeds. When needed, the layer can be peeled from the adhesive with a force not exceeding 400 grams. The ethylene polymers used in this invention include polyethylene and copolymers of ethylene with other monomers.
Career Highlights
Doyle O. Etter has had a distinguished career, working at the Eastman Kodak Company. His role at this prestigious company has allowed him to contribute to advancements in photographic technology. His innovative approach has led to the development of practical solutions that enhance the usability of photographic elements.
Collaborations
Doyle has collaborated with several professionals in his field, including his coworker Irvin H. Crawford. Their combined expertise has fostered an environment of innovation and creativity within their projects.
Conclusion
Doyle O. Etter's contributions to the field of photographic elements through his patent demonstrate his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
