Company Filing History:
Years Active: 2024
Title: Dowon Ahn: Innovator in Resist Underlayer Composition
Introduction
Dowon Ahn is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of resist underlayer compositions used in various applications.
Latest Patents
Ahn holds a patent for a resist underlayer composition and a method of forming patterns using this composition. The patent details a resist underlayer composition that includes (A) a polymer with a structural unit represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof; (B) a polymer that includes a structure where at least one moiety represented by Chemical Formula 3 or Chemical Formula 4 is bound to a moiety represented by Chemical Formula 7; and (C) a solvent. This innovation is crucial for enhancing the performance of electronic devices.
Career Highlights
Dowon Ahn is currently employed at Samsung SDI Co., Inc., where he continues to push the boundaries of technology through his research and development efforts. His work has been instrumental in advancing the capabilities of materials used in electronic applications.
Collaborations
Ahn collaborates with talented colleagues, including Yoojeong Choi and Soonhyung Kwon, who contribute to the innovative environment at Samsung SDI Co., Inc. Their teamwork fosters creativity and leads to groundbreaking advancements in their field.
Conclusion
Dowon Ahn's contributions to the field of resist underlayer compositions exemplify the impact of innovation in technology. His work not only enhances the performance of electronic devices but also showcases the importance of collaboration in achieving significant advancements.