The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Jan. 12, 2021
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Yoojeong Choi, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Minsoo Kim, Suwon-si, KR;
Shinhyo Bae, Suwon-si, KR;
Daeseok Song, Suwon-si, KR;
Dowon Ahn, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 251/34 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
C07D 251/34 (2013.01); G03F 7/0045 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/26 (2013.01);
Abstract
A resist underlayer composition includes (A) a polymer including a structural unit represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof; (B) a polymer including a structure in which at least one moiety represented by Chemical Formula 3 or Chemical Formula 4 and a moiety represented by Chemical Formula 7 are bound to each other; and (C) a solvent: