Douglas W Carson

Title: Innovations of Douglas W. Carson

Introduction

Douglas W. Carson is an accomplished inventor based in Berkeley, CA. He has made significant contributions to the field of chemical vapor deposition, particularly in the enhancement of titanium nitride deposition processes. With a total of 2 patents to his name, Carson's work has implications for semiconductor manufacturing.

Latest Patents

Carson's latest patents focus on the deposition of titanium amides. The first patent describes a process for enhancing the chemical vapor deposition of titanium nitride from titanium-containing precursors, such as tetrakis(dimethylamino)titanium and tetrakis(diethylamino)titanium. This process involves reacting these precursors with ammonia to produce titanium nitride on a semiconductor substrate. The addition of organic amines, like dipropylamine, in specific weight percentages significantly enhances the deposition rate of titanium nitride. Furthermore, the patent emphasizes the importance of purifying the titanium-containing precursor to remove hydrocarbon impurities, which can retard the deposition rate.

Career Highlights

Douglas W. Carson is currently employed at Air Products and Chemicals, Inc. His work at this company has allowed him to focus on innovative solutions in the field of chemical vapor deposition. His expertise and research have contributed to advancements in semiconductor technology.

Collaborations

Carson has collaborated with notable coworkers, including Matthias J. Jahl and Shantia Riahi. These collaborations have fostered a productive environment for innovation and research in their field.

Conclusion

Douglas W. Carson's contributions to the field of chemical vapor deposition and his innovative patents highlight his role as a significant inventor in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.