Hakalau, HI, United States of America

Douglas Toomey

This inventor holds 1 USPTO granted patent. Top assignee: Carnegie Mellon University. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Douglas Toomey. Retrieved from https://idiyas.com/inventor/douglas-toomey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Douglas Toomey: Innovator in Iris Imaging Technology

Introduction

Douglas Toomey is a notable inventor based in Hakalau, Hawaii. He has made significant contributions to the field of imaging technology, particularly in the acquisition of iris images. His innovative work has the potential to enhance various applications, including security and biometric identification.

Latest Patents

Toomey holds a patent for a "System and method for the long range acquisition of iris images from stationary and mobile subjects." This system is capable of capturing images of the iris from distances of up to 11 meters, with a resolution of 150-200 pixels across the diameter. The technology incorporates velocity estimation and focus tracking modules, allowing for the acquisition of images from moving subjects.

Career Highlights

Douglas Toomey is affiliated with Carnegie Mellon University, where he continues to advance his research and development in imaging technologies. His work is recognized for its innovative approach and practical applications in real-world scenarios.

Collaborations

Toomey has collaborated with esteemed colleagues, including Marios Savvides and Kahlid Harun. Their combined expertise contributes to the advancement of technology in the field of iris imaging.

Conclusion

Douglas Toomey's contributions to iris imaging technology exemplify the impact of innovation in enhancing security and biometric systems. His work continues to pave the way for future advancements in this critical area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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