Douglas Newman

Title: Innovations of Douglas Newman in Semiconductor Processing

Introduction

Douglas Newman is an accomplished inventor based in Crowley, Texas. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent that addresses the optimization of dopant doses.

Latest Patents

Newman's notable patent is titled "Variable implant and wafer-level feed-forward for dopant dose optimization." This patent presents a method for adjusting implant parameter conditions in semiconductor processing by utilizing in-line measurements from previous operations. The feed-forward computer model he developed is based on a sensitivity map of in-line measured data and its effect on electrical performance. This innovation enhances both wafer-to-wafer and within-wafer electrical uniformity in semiconductor devices.

Career Highlights

Douglas Newman is currently employed at Texas Instruments Corporation, where he applies his expertise in semiconductor technology. His work focuses on improving the efficiency and performance of semiconductor devices through advanced processing techniques.

Collaborations

Some of his coworkers include Mahalingam Nandakumar and Murlidhar Bashyam, who collaborate with him on various projects within the semiconductor field.

Conclusion

Douglas Newman’s contributions to semiconductor processing through his innovative patent demonstrate his commitment to advancing technology in this critical industry. His work continues to influence the development of more efficient semiconductor devices.