Douglas M Horn

Title: Douglas M. Horn and a Multi-Wavelength Mask for Multilayer Printing

Introduction

Douglas M. Horn is an inventor associated with Portland, Oregon, and LSI Corporation. His patent work addresses a challenge in integrated-circuit manufacturing: accurately aligning patterns for separate layers during printing.

Latest Patents

Horn is credited with 1 patent, titled “Multi Wavelength Mask for Multi Layer Printing on a Process Substrate.” The invention describes a mask designed to expose two separate layers of an integrated circuit on a process substrate.

The mask uses a substrate that transmits two different wavelengths of light. A first patterned material is substantially opaque to the first wavelength, while a second patterned material is substantially opaque to the second wavelength. The patterns are aligned on the mask so that the corresponding layers can be properly aligned on the process substrate.

Career Highlights

Horn’s listed patent connects his work with LSI Corporation to semiconductor fabrication and multilayer patterning. The invention’s approach uses wavelength-selective materials to support the accurate placement of patterns for different integrated-circuit layers.

Collaborations

Horn’s listed coworkers include Duane B. Barber and Phong Thanh Do. Their names provide context for the professional network associated with his work.

Conclusion

Douglas M. Horn’s patent describes a wavelength-selective mask intended to improve alignment when printing multiple integrated-circuit layers, reflecting a focused contribution to semiconductor manufacturing.