Wilmington, DE, United States of America

Douglas Leach

This inventor holds 1 USPTO granted patent. Top assignee: Metton America, Inc.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Douglas Leach. Retrieved from https://idiyas.com/inventor/douglas-leach-j6op58m0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Douglas Leach: Innovator in Polymer Technology

Introduction

Douglas Leach is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of polymer technology, particularly through his innovative patent.

Latest Patents

Douglas Leach holds a patent for "Polydicyclopentadiene having improved stability and toughened with - Process for making a polymer and the resultant polymer." This invention involves polymer particles that have a core and shell structure, where the core comprises polybutadiene and the shell comprises polymethylmethacrylate. The resultant polymer exhibits improved resistance to oxidation and greater retention of mechanical properties upon thermal aging, enhancing its toughness.

Career Highlights

Douglas Leach is associated with Metton America, Inc., where he applies his expertise in polymer science. His work focuses on developing advanced materials that meet the demands of various industrial applications.

Collaborations

He collaborates with Nitya P Khasat, contributing to the innovative projects at Metton America, Inc. Their combined efforts aim to push the boundaries of polymer technology.

Conclusion

Douglas Leach's contributions to polymer technology through his patent and work at Metton America, Inc. highlight his role as an influential inventor in the field. His innovations continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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