Company Filing History:
Years Active: 2024
Title: Douglas Koeller: Pioneering Innovations in Substrate Measurement
Introduction
Douglas Koeller, an accomplished inventor based in Beaverton, Oregon, has made significant contributions to the field of materials measurement technology. With a focus on innovative systems, he has been instrumental in developing new methods that enhance precision and efficiency in substrate analysis.
Latest Patents
Koeller holds a patent for "Systems and methods for in-situ measurement of sheet resistance on substrates." This groundbreaking invention showcases a Vacuum Pre-treatment Module (VPM) metrology system designed for accurately measuring the sheet resistance of layers on substrates. The innovative system incorporates an eddy sensor consisting of a sender and receiver sensor, which work together within a defined gap to facilitate effective testing of substrate edges. The precision of the measurement signals collected by the eddy sensor is enhanced through a sensor controller, while a data processor effectively processes this data to generate reliable sheet resistance values.
Career Highlights
Currently, Douglas Koeller is associated with Lam Research Corporation, a leader in providing innovative semiconductor manufacturing equipment and services. His work within the organization has focused on pushing the boundaries of metrology systems, emphasizing the importance of accurate measurements in maintaining the performance quality of semiconductor devices. His contributions reflect the company's commitment to operational excellence and technological advancement.
Collaborations
Throughout his career, Koeller has collaborated with talented professionals such as Manish Ranjan and Andrew James Pfau. These partnerships have fostered innovative ideas and contributed to the development of effective solutions in substrate measurement technology, promoting collaborative research that drives the industry forward.
Conclusion
Douglas Koeller's contributions as an inventor in the realm of substrate measurement technology signify a commitment to innovation and excellence. His patent highlights the importance of advancing metrology systems in semiconductor manufacturing, ensuring that precision and accuracy remain at the forefront of the industry.