The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Sep. 29, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Manish Ranjan, Sherwood, OR (US);

Andrew James Pfau, Portland, OR (US);

Douglas Hill, Tigard, OR (US);

Douglas Koeller, Beaverton, OR (US);

Burton Williams, Portland, OR (US);

Shantinath Ghongadi, Tigard, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/04 (2006.01); C23C 14/52 (2006.01); G01N 33/20 (2019.01);
U.S. Cl.
CPC ...
G01N 27/041 (2013.01); C23C 14/52 (2013.01); G01N 33/20 (2013.01);
Abstract

In some examples, a Vacuum Pre-treatment Module (VPM) metrology system is provided for measuring a sheet resistance of a layer on a substrate. The system may comprise an eddy sensor including a sender sensor and a receiver sensor defining a gap between them for accepting an edge of a substrate to be tested. A sensor controller receives measurement signals from the eddy sensor. A data processor processes the measurement signals and generates sheet resistance values for the layer on the substrate.


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