Company Filing History:
Years Active: 1998-2003
Title: **Douglas J Dopp: Innovator in Semiconductor Technology**
Introduction
Douglas J Dopp is a notable inventor based in Austin, TX, renowned for his contributions to the field of semiconductor technology. With three patents to his name, he has developed innovative processes that enhance the efficiency of semiconductor manufacturing. His expertise has been instrumental in advancing techniques that are essential in modern electronic devices.
Latest Patents
Douglas J Dopp's latest patents include a significant advancement in the removal of etch residue resulting from the formation of vias in semiconductor devices. The method he developed utilizes a unique approach that avoids the use of liquid chemical solvents while mitigating excessive charge build-up within the vias. By combining fluorocarbon and oxygen gases, energized by both microwave and RF sources, he has created a process that effectively removes residue. An additional step involves introducing argon gas, further ensuring complete residue removal while preventing surface contamination. Finally, his method incorporates the application of de-ionized water to eliminate any remaining fluorinated residue, leveraging its high solubility.
Another notable patent focuses on forming semiconductor devices, specifically the process for creating via openings between aluminum-containing interconnects. This process details the removal of veil material formed during the etching of insulating layers. Through a combination of a first dry etch—utilizing oxygen and fluorine-containing gases—followed by exposure to an aqueous organic solvent, Douglas’ method effectively eliminates the veil without damaging the underlying layers. Moreover, by reducing the temperature of the solvent, he addresses the environmental concerns related to volatile organic compound emissions.
Career Highlights
Douglas J Dopp's career has been closely associated with Motorola Corporation, where he has played a pivotal role in several semiconductor advancements. His innovative approaches and discoveries have greatly contributed to improving the reliability and efficiency of devices produced by the company.
Collaborations
Throughout his career, Douglas has collaborated with esteemed professionals, including Robert Arthur Rodriguez and Robert E. Booth. Together, they have worked diligently to push the boundaries of semiconductor technology, leading to groundbreaking inventions that have shaped the industry.
Conclusion
In conclusion, Douglas J Dopp stands as a prominent figure in the field of semiconductor technology, with a significant portfolio of patents that reflect his dedication to innovation. His unique methods for enhancing semiconductor manufacturing processes demonstrate his commitment to advancing technology, which continues to impact the industry positively.