San Diego, CA, United States of America

Douglas E Knight


 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 27(Granted Patents)


Location History:

  • Santa Barbara, CA (US) (2019)
  • San Diego, CA (US) (2002 - 2022)

Company Filing History:


Years Active: 2002-2022

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11 patents (USPTO):Explore Patents

Title: Douglas E Knight: Innovator in Fabric Printable Mediums

Introduction

Douglas E Knight is a prominent inventor based in San Diego, CA. He holds a total of 11 patents that showcase his innovative contributions to the field of fabric printable mediums. His work has significantly impacted the way fabrics are treated and utilized in various applications.

Latest Patents

Among his latest patents, Knight has developed a fabric printable medium that includes a fabric base substrate composed of yarn strands and voids among the strands. This medium features a finishing coating that is attached to the yarn strands, forming coated yarn strands. The finishing coating consists of a first and a second crosslinked polymeric network, creating pore spaces that coincide with the voids of the fabric base substrate. Another notable patent is the fabric print medium, which includes a treated fabric base substrate with a waterproofing treatment. This medium also incorporates an adhesion promoting layer and an image-receiving layer, enhancing the fabric's ability to receive images effectively.

Career Highlights

Douglas E Knight has had a distinguished career, working with notable companies such as Hewlett-Packard Development Company, L.P. and Hewlett-Packard Company. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in fabric technology.

Collaborations

Throughout his career, Knight has collaborated with talented individuals, including Eric Lee Burch and Xiaoqi Zhou. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Douglas E Knight's contributions to fabric printable mediums demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of material science and technology, paving the way for future advancements in fabric applications.

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