Douglas D Truong

Title: Douglas D Truong: Innovator in RF Technology

Introduction

Douglas D Truong is a notable inventor based in San Jose, California. He has made significant contributions to the field of radio frequency (RF) technology, particularly in applications related to plasma chambers. With a total of 2 patents to his name, Truong's work is recognized for its innovative approach to RF power coupling.

Latest Patents

Truong's latest patents include a groundbreaking invention titled "Transmission line RF applicator for plasma chamber." This apparatus and method are designed for effectively coupling RF power to a plasma within a plasma chamber. The invention features two conductors, one of which is equipped with a plurality of apertures. Notably, the apertures vary in size, spacing, and orientation across different sections of the conductor. Additionally, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. The design also incorporates an inner conductor along with one or two outer conductors, where the main portion of each outer conductor includes multiple apertures extending between its inner and outer surfaces.

Career Highlights

Douglas D Truong is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His role at the company allows him to further develop and refine his innovative ideas in RF technology.

Collaborations

Truong has collaborated with several talented individuals in his field, including Jozef Kudela and Tsutomu Tanaka. These collaborations have likely contributed to the advancement of his research and the successful development of his patents.

Conclusion

In summary, Douglas D Truong is a prominent inventor whose work in RF technology has led to significant advancements in plasma chamber applications. His innovative patents and contributions to Applied Materials, Inc. highlight his expertise and commitment to the field.