Thornton, PA, United States of America

Douglas C Lawrence

This inventor holds 1 USPTO granted patent. Top assignee: Solvetech Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Douglas C Lawrence. Retrieved from https://idiyas.com/inventor/douglas-c-lawrence-ujpkokzx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Douglas C. Lawrence

Introduction

Douglas C. Lawrence is an accomplished inventor based in Thornton, PA (US). He has made significant contributions to the field of technology, particularly with his innovative patent that addresses challenges in web processing. His work exemplifies the spirit of invention and the pursuit of practical solutions.

Latest Patents

One of Douglas C. Lawrence's notable patents is the "Edge position sensor with integral thickness gauge." This invention provides a system for determining the edge of a continuous web while compensating for non-uniformity in dielectric response, including thickness. The invention features a first electrode that outputs a signal corresponding to the edge position of the web, and a second electrode that outputs a signal related to the thickness of the web. The relationship between the output signals of these electrodes enhances the accuracy of edge detection in various applications.

Career Highlights

Douglas C. Lawrence is associated with Solvetech Corporation, where he applies his expertise in developing innovative solutions. His work at the company has contributed to advancements in technology and has positioned him as a key figure in his field. With a patent portfolio that includes 1 patent, he continues to push the boundaries of what is possible in web processing technology.

Collaborations

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Conclusion

Douglas C. Lawrence's contributions to the field of technology through his innovative patent demonstrate his commitment to solving real-world problems. His work continues to inspire future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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