Company Filing History:
Years Active: 2004-2005
Title: Douglas B Ingerly: Innovator in Low-Dielectric Materials
Introduction
Douglas B Ingerly is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of materials science, particularly in the treatment of low-dielectric constant materials. With a total of 2 patents to his name, Ingerly's work has implications for various applications in the electronics industry.
Latest Patents
Ingerly's latest patents include a method for treating the surface of low-dielectric constant material to achieve good mechanical strength. This invention discloses a method that involves providing a substrate, forming a dielectric material over the substrate, creating an opening in the dielectric material, treating the surface of the dielectric material, forming a conductor in the opening, and planarizing the conductor. Additionally, he has developed a treatment process for low-k dielectric material for chemical mechanical polishing (CMP), which enhances the performance of electronic components.
Career Highlights
Douglas B Ingerly is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has allowed him to explore advanced materials and processes that are crucial for the development of next-generation electronic devices.
Collaborations
Ingerly collaborates with various professionals in his field, including his coworker Brett Robert Schroeder. Their combined expertise contributes to the advancement of technologies that rely on low-dielectric materials.
Conclusion
Douglas B Ingerly is a prominent inventor whose work in low-dielectric materials has the potential to impact the electronics industry significantly. His innovative patents and contributions to Intel Corporation highlight his role as a key figure in materials science.