Douglas A West

Title: The Innovations of Douglas A. West

Introduction

Douglas A. West is a notable inventor based in Boca Raton, FL (US). He has made significant contributions to the field of technology, particularly in the area of photoresist film applications. His innovative work has led to the development of a unique mechanism that enhances the efficiency of photoresist film application processes.

Latest Patents

Douglas A. West holds a patent for a "Photo resist film application mechanism." This invention features a dry film photoresist laminator that includes a punch and die assembly. The assembly punches a rolled sheet of dry film photoresist material, which is sandwiched between a Mylar top layer and a polyolefin bottom layer, into photoresist decals. These decals are bonded to a tacky transport tape that carries them to a polyolefin peeler assembly. The assembly rolls a high tack tape along the polyolefin layer of the decal, effectively peeling it from the decal. The decal is then advanced by a laminating assembly that rolls it onto a heated wafer, bonding the exposed photoresist material to the wafer. The bonded wafer and decal are subsequently removed from the transport tape.

Career Highlights

Douglas A. West is associated with the International Business Machines Corporation (IBM), where he has contributed to various technological advancements. His work in the field has been recognized for its innovative approach and practical applications.

Collaborations

Throughout his career, Douglas has collaborated with notable colleagues, including William A. Brady and See Ark Chan. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Douglas A. West's contributions to the field of photoresist film applications exemplify the spirit of innovation. His patent and work at IBM highlight his role as a significant inventor in the technology sector.