Location History:
- Providence, RI (US) (1992)
- Belle Mead, NJ (US) (1991 - 1998)
Company Filing History:
Years Active: 1991-1998
Title: Douglas A. Usifer: Innovator in Electrical Component Protection
Introduction
Douglas A. Usifer, based in Belle Mead, NJ, is a distinguished inventor with a portfolio that includes eight patents. His innovative work primarily revolves around electrical components and protective layers that enhance their functionality and durability.
Latest Patents
One of Usifer's latest patents focuses on an exterior protective layer for electrical components. This invention details an electrical component with a protective layer covering at least part of its surface. The innovative layer is a cured copolymer formed through the reaction of at least one oligomer and one monomer, both featuring terminal ethylenically unsaturated groups. In other variations, the layer can comprise a copolymer reaction between multiple oligomers. The process is enhanced by using a free radical initiator curing agent and a transition metal catalyst, demonstrating Usifer’s commitment to advancing materials for greater reliability and performance.
Career Highlights
Throughout his career, Usifer has made significant contributions while working with reputable companies such as Caschem, Inc. and Hoechst Celanese Corporation. His expertise in material science and engineering has allowed him to drive innovation in the electrical components field, leading to the successful development of protective solutions that address industry needs.
Collaborations
In his professional journey, Usifer has collaborated with respected colleagues like Ifeanyi C. Broderick and Melvin Brauer. These partnerships have likely enriched his work, providing diverse perspectives and expertise, and contributing to his successful patent portfolio.
Conclusion
Douglas A. Usifer stands as a noteworthy inventor dedicated to enhancing the safety and efficiency of electrical components through innovative protection methods. His work continues to impact the industry positively, inspiring future advancements in the realm of electrical engineering.