Caschem, Inc.

Hoechst Celanese Corporation

Cashem, Inc.

Douglas A Usifer

Ifeanyi C Broderick

Melvin Brauer

Yuan Chieh Chu

James C Chang

Dana L Durham

Michael J McFarland

Mark A Spak

Sangya Jain

Donald C Mammato

Michael G Kelly

Carlos M Ramirez

An electrical component comprising an electrical component having an exterior protective layer on at least a portion of a surface. The layer is a cured copolymer of a reaction between at least one oligomer having a terminal ethylenically unsaturated group and at least one monomer having a terminal ethylenically unsaturated group. Alternatively, the layer is a cured copolymer of a reaction between at least two oligomers having a terminal ethylenically unsaturated group. The copolymerization reaction is preferably in the presence of a free radical initiator curing agent and a transition metal catalyst.

Exterior protective layer for an electrical component

UV curable adhesive compositions which provide improved bonding to substrates such as carbonates and metals is provided. The compositions are formed as the reaction product of a urethane methacrylate and reactive diluents such as N-vinyl caprolactam and isobornyl acrylate, a photoinitiator compound, and adhesion promoting additives. Urethane methacrylates which may be employed include ester-based urethane methacrylates as well as ether based urethane methacrylates. Also, methods of bonding substrates using their compositions and the articles produced by the methods.

Urethane adhesive compositions

The invention relates to polyurethane compositions that can be formulated as a two component systems of a first component of a polyol and an amine of formula (I): ##STR1## and a second component of isocyanate. This invention further relates to methods of formulating those polyurethanes, and to use of those polyurethanes in separatory devices.

Polyurethane compositions

A photolithographic resist with sensitivity for actinic radiation in the short wavelength, ultraviolet region is produced from (1) an organic film-forming material, and (2) an oxime carboxylate ester which releases a carboxylic acid on exposure to deep ultraviolet radiation, thereby rendering the composition more soluble in a developer in the exposed regions than in the unexposed regions. A process for the formation of an image is also disclosed comprising (1) exposing the above composition to actinic radiation in a pre-determined pattern and (2) treating the composition with aqueous base developer to remove the exposed areas. The image-forming process may be used in the production of printing plates and microelectronic circuits.

Positive-working photoresist compositions

A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.

Method of producing an image reversal negative photoresist having a

Growing community of inventors

Belle Mead, NJ, United States of America

Douglas A Usifer