This inventor holds 1 USPTO granted patent. Top assignee: Eaton Corporation. Active years: 1993.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993
Title: The Innovations of Dorsey T. Smith: A Visionary in Ion Implantation Technology
Introduction
Dorsey T. Smith is a notable inventor based in Austin, TX, recognized for his contributions to ion implantation technology. With one patent to his name, Smith has demonstrated a commitment to advancing the capabilities of ion implanters, which are critical in semiconductor manufacturing.
Latest Patents
Dorsey T. Smith holds a patent for an "End Station for a Parallel Beam Ion Implanter." This invention features an end station designed to enhance the performance of ion implanters by incorporating a loading station, a loadlock station, a vacuum chamber, and an advanced wafer handler. The wafer handler is equipped with a multi-axis arm system capable of precise wafer positioning, allowing for both low and high-angle incidence implantation. It can rotate the wafer around an axis perpendicular to its surface and perform scanning motions along a straight line that intersects the wafer tilt axis in any tilt position. Additionally, the loadlock component of this invention includes an upper element to receive wafers from the loading station and a lower element that positions the wafers for effective transfer to the wafer handler.
Career Highlights
Dorsey T. Smith is affiliated with Eaton Corporation, a respected leader in the field of electrical and industrial solutions. His work there underlines his role in developing cutting-edge technology within the sector, contributing significantly to the efficiency and efficacy of semiconductor manufacturing processes.
Collaborations
Throughout his career, Smith has collaborated with talented professionals such as Robert A. Brune and Andrew M. Ray. Their collective expertise has undoubtedly influenced the innovation process, paving the way for improvements in ion implantation technology and semiconductor fabrication.
Conclusion
Dorsey T. Smith's innovations, especially his patent for the end station of a parallel beam ion implanter, demonstrate his significant contributions to the field of semiconductor technology. Through his work at Eaton Corporation and collaborations with esteemed colleagues, Smith continues to play a pivotal role in advancing the capabilities of ion implantation systems, thereby supporting the ongoing evolution of the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
