Austin, TX, United States of America

Dorsey T Smith

This inventor holds 1 USPTO granted patent. Top assignee: Eaton Corporation. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dorsey T Smith. Retrieved from https://idiyas.com/inventor/dorsey-t-smith-shcjq53q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dorsey T. Smith: A Visionary in Ion Implantation Technology

Introduction

Dorsey T. Smith is a notable inventor based in Austin, TX, recognized for his contributions to ion implantation technology. With one patent to his name, Smith has demonstrated a commitment to advancing the capabilities of ion implanters, which are critical in semiconductor manufacturing.

Latest Patents

Dorsey T. Smith holds a patent for an "End Station for a Parallel Beam Ion Implanter." This invention features an end station designed to enhance the performance of ion implanters by incorporating a loading station, a loadlock station, a vacuum chamber, and an advanced wafer handler. The wafer handler is equipped with a multi-axis arm system capable of precise wafer positioning, allowing for both low and high-angle incidence implantation. It can rotate the wafer around an axis perpendicular to its surface and perform scanning motions along a straight line that intersects the wafer tilt axis in any tilt position. Additionally, the loadlock component of this invention includes an upper element to receive wafers from the loading station and a lower element that positions the wafers for effective transfer to the wafer handler.

Career Highlights

Dorsey T. Smith is affiliated with Eaton Corporation, a respected leader in the field of electrical and industrial solutions. His work there underlines his role in developing cutting-edge technology within the sector, contributing significantly to the efficiency and efficacy of semiconductor manufacturing processes.

Collaborations

Throughout his career, Smith has collaborated with talented professionals such as Robert A. Brune and Andrew M. Ray. Their collective expertise has undoubtedly influenced the innovation process, paving the way for improvements in ion implantation technology and semiconductor fabrication.

Conclusion

Dorsey T. Smith's innovations, especially his patent for the end station of a parallel beam ion implanter, demonstrate his significant contributions to the field of semiconductor technology. Through his work at Eaton Corporation and collaborations with esteemed colleagues, Smith continues to play a pivotal role in advancing the capabilities of ion implantation systems, thereby supporting the ongoing evolution of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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