Eltville, Germany

Dorothee Griesch

This inventor holds 1 USPTO granted patent. Top assignee: Hoechst Aktiengesellschaft. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dorothee Griesch. Retrieved from https://idiyas.com/inventor/dorothee-griesch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dorothee Griesch

Introduction

Dorothee Griesch is a notable inventor based in Eltville, Germany. She has made significant contributions to the field of photographic technology, particularly in exposure control methods. Her work has been recognized for its innovative approach to improving photographic printing processes.

Latest Patents

Dorothee Griesch holds a patent for "Methods and apparatus for automatic exposure control." This invention relates to a method of exposure control in photographic printing apparatus for printing from originals made on different types of photographic material. The method enhances the quality and consistency of photographic prints, making it a valuable advancement in the industry.

Career Highlights

Griesch has had a successful career at Hoechst Aktiengesellschaft, where she has applied her expertise in photographic technology. Her work has not only contributed to the company's reputation but has also advanced the field of photography.

Collaborations

Throughout her career, Dorothee has collaborated with notable colleagues, including Herbert Schroter and Peter Schwagler. These collaborations have fostered innovation and have led to the development of new technologies in photographic printing.

Conclusion

Dorothee Griesch's contributions to photographic technology through her innovative patent demonstrate her significant role as an inventor. Her work continues to influence the industry and showcases the importance of advancements in exposure control methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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