Haigerloch, Germany

Dorothea Becker

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Manroland Web Systems Gmbh. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dorothea Becker. Retrieved from https://idiyas.com/inventor/dorothea-becker-bwdm5fy4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Dorothea Becker

Introduction

Dorothea Becker is a notable inventor from Haigerloch, Germany, recognized for her innovative approach to cleaning print-related surfaces. With a focus on enhancing the efficiency of printing processes, her work has made a significant impact in the printing industry.

Latest Patents

Becker holds a patent for a method designed to clean rotating surfaces of printing press cylinders and rollers. This method involves applying a liquid, water-based washing agent that contains at least 60% water and surfactants. The process includes dissolving contaminants from the surface using the washing agent and a cleaning device, followed by the removal of these dissolved contaminants.

Career Highlights

Throughout her career, Dorothea Becker has worked with prominent companies in the printing sector. She has been associated with Manroland Web Systems GmbH and Manroland Goss Web Systems GmbH, where she contributed her expertise in developing innovative cleaning solutions for printing technologies.

Collaborations

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Conclusion

Dorothea Becker's contributions to the field of printing technology through her innovative cleaning methods exemplify her dedication to improving industry standards. Her patent reflects a significant advancement in maintaining the efficiency of printing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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