San Francisco, CA, United States of America

Dore C Mark

This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Company. Active years: 2000-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dore C Mark. Retrieved from https://idiyas.com/inventor/dore-c-mark

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Dore C Mark: Innovator in Data Storage Solutions

Introduction

Dore C Mark is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of data storage technology. With a total of 2 patents to his name, Mark has demonstrated his expertise and innovative spirit in this rapidly evolving industry.

Latest Patents

Among his latest inventions is a face plate for a data storage enclosure. This innovation aims to enhance the functionality and design of data storage solutions. His work in this area reflects a commitment to improving user experience and efficiency in data management.

Career Highlights

Dore C Mark is currently employed at Hewlett-Packard Company, where he continues to develop cutting-edge technologies. His role at such a prestigious company underscores his importance in the field of data storage solutions. Mark's contributions have been instrumental in advancing the capabilities of data storage systems.

Collaborations

Throughout his career, Dore C Mark has collaborated with talented individuals such as Thomas S Neal and Jon C Lake. These partnerships have allowed him to leverage diverse expertise and drive innovation in his projects.

Conclusion

Dore C Mark is a distinguished inventor whose work in data storage technology has made a lasting impact. His patents and collaborations highlight his dedication to innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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