Company Filing History:
Years Active: 2016-2017
Title: Doo Hyun Yoon: Innovator in Thin Film Technology
Introduction
Doo Hyun Yoon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of thin film technology, holding two patents that showcase his innovative approaches.
Latest Patents
His latest patents include a "Thin film activation method using electrical energy" and a "Thin film transistor fabrication method." The inventive concept relates to a thin film activation method, a thin film transistor fabrication method, and a substrate processing device. More particularly, it focuses on activating a thin film by using electrical energy and fabricating a thin film transistor. Additionally, he has developed an "Oxide thin film, method for post-treating oxide thin film and electronic apparatus." This patent provides an oxide thin film with a single layer that includes a metal oxide, where the physical properties of the oxide thin film may change in the thickness direction.
Career Highlights
Doo Hyun Yoon is affiliated with Yonsei University, where he continues to advance research in thin film technologies. His work has implications for various electronic applications, enhancing the performance and efficiency of devices.
Collaborations
Some of his notable coworkers include Hyun Jae Kim and Young Jun Tak, who contribute to the collaborative research environment at Yonsei University.
Conclusion
Doo Hyun Yoon's innovative work in thin film technology positions him as a key figure in the field, with patents that reflect his expertise and forward-thinking approach. His contributions are likely to influence future advancements in electronic devices.