Daejeon, South Korea

Doo Hyun Lee

This inventor holds 1 USPTO granted patent and 3 EPO patents. Top assignee: Lg Energy Solution, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Doo Hyun Lee. Retrieved from https://idiyas.com/inventor/doo-hyun-lee-u7cjoufs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Doo Hyun Lee: Innovator in Coating Technology

Introduction

Doo Hyun Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of coating technology, particularly in the development of methods that enhance efficiency in manufacturing processes.

Latest Patents

One of his notable patents is titled "Dual slot die for simultaneously performing electrode slurry coating and insulating solution coating and coating method using the same." This invention addresses the challenge of electrode slurry sliding at the edges of the electrode slurry layer. By utilizing a dual slot die, the invention allows for the simultaneous application of electrode slurry and insulating solution coatings. This innovative approach increases process efficiency by enabling the formation of both layers on a current collector sheet in a multi-line manner.

Career Highlights

Doo Hyun Lee is associated with LG Energy Solution, Ltd., where he continues to work on advancing technologies in energy solutions. His expertise in coating methods has positioned him as a valuable asset in the field.

Collaborations

He has collaborated with notable colleagues, including Chang Bum Ahn and Jae Huoung Son, to further enhance the development of innovative solutions in their projects.

Conclusion

Doo Hyun Lee's contributions to coating technology exemplify the impact of innovation in manufacturing processes. His work not only improves efficiency but also sets a precedent for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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